Elementary processes of surface reaction in amorphous...

Applied Surface Science 1992 Vol. 60-61; Iss. none

Elementary processes of surface reaction in amorphous silicon film growth

Setsuko Oikawa, Satomi Ohtsuka, Minoru Tsuda
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Volume:
60-61
Year:
1992
Language:
english
Pages:
10
DOI:
10.1016/0169-4332(92)90392-b
File:
PDF, 357 KB
english, 1992
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