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Statistical properties of atomic-scale Si/SiO2 interface roughness studied by STM
M. Niwa, H. Iwasaki, Y. Watanabe, I. Sumita, N. Akutsu, Y. AkutsuVolume:
60-61
Year:
1992
Language:
english
Pages:
6
DOI:
10.1016/0169-4332(92)90393-c
File:
PDF, 793 KB
english, 1992