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Characterization of SiO2/Si(100) interface structure of N2O-oxynitrided ultrathin SiO2 films
Hisashi Fukuda, Makoto Yasuda, Toshiyuki Iwabuchi, Seigo OhnoVolume:
60-61
Year:
1992
Language:
english
Pages:
8
DOI:
10.1016/0169-4332(92)90444-3
File:
PDF, 1.65 MB
english, 1992