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Technological aspects of epitaxial CoSi2 layers for CMOS
A. Lauwers, R.J. Schreutelkamp, B. Brijs, H. Bender, K. MaexVolume:
73
Year:
1993
Language:
english
Pages:
6
DOI:
10.1016/0169-4332(93)90141-w
File:
PDF, 812 KB
english, 1993