Technological aspects of epitaxial CoSi2 layers for CMOS

Technological aspects of epitaxial CoSi2 layers for CMOS

A. Lauwers, R.J. Schreutelkamp, B. Brijs, H. Bender, K. Maex
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
73
Year:
1993
Language:
english
Pages:
6
DOI:
10.1016/0169-4332(93)90141-w
File:
PDF, 812 KB
english, 1993
Conversion to is in progress
Conversion to is failed