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Temperature dependence of synchrotron radiation induced growth initiation in the molecular beam chemical vapor deposition of Al on a SiO2 surface
Fumihiko Uesugi, Iwao NishiyamaVolume:
69
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0169-4332(93)90477-s
File:
PDF, 365 KB
english, 1993