Bulk and surface properties of RTCVD Si3N4 films for optical device applications
F. Lebland, Z.Z. Wang, J. Flicstein, C. Licoppe, Y.I. NissimVolume:
69
Year:
1993
Language:
english
Pages:
6
DOI:
10.1016/0169-4332(93)90504-5
File:
PDF, 565 KB
english, 1993