Oxidation of tantalum silicide thin films in an RF oxygen plasma
R.Gómez-San Román, R. Pérez-Casero, J. Perrière, J.P. Enard, J.M. Martínez-DuartVolume:
70-71
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0169-4332(93)90565-s
File:
PDF, 257 KB
english, 1993