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Effect of low temperature annealing on the surface state of a-Si:H films
Kazuki Ishikawa, Kazuo Okada, Makio Akimoto, Yasuo GekkaVolume:
70-71
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0169-4332(93)90603-9
File:
PDF, 268 KB
english, 1993