Enhanced adherence of electroless metal deposit on SiO2 via control of the chemical environment of the Pd seeding layer
G.A. Shafeev, L. Bellard, J.-M. Themlin, W. Marine, A. CrosVolume:
86
Year:
1995
Language:
english
Pages:
5
DOI:
10.1016/0169-4332(94)00461-7
File:
PDF, 417 KB
english, 1995