Conditions for successful low-temperature growth of hydrogenated amorphous silicon film from silyl radicals conformed to layer-growth mode
Mitsuo Kawasaki, Hideo Suzuki, Yusuke KawaguchiVolume:
79-80
Year:
1994
Language:
english
Pages:
6
DOI:
10.1016/0169-4332(94)90428-6
File:
PDF, 442 KB
english, 1994