Silicon dioxide film deposited by photoassisted microwave...

Applied Surface Science 1994 Vol. 79-80; Iss. none

Silicon dioxide film deposited by photoassisted microwave plasma CVD using TEOS

Nobumasa Suzuki, Kazuya Masu, Kazuo Tsubouchi
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Volume:
79-80
Year:
1994
Language:
english
Pages:
5
DOI:
10.1016/0169-4332(94)90431-6
File:
PDF, 312 KB
english, 1994
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