Photoelectron spectroscopic investigations of thin...

Applied Surface Science 1995 Vol. 91; Iss. 1-4

Photoelectron spectroscopic investigations of thin FexSi100−x films

R. Kilper, St. Teichert, Th. Franke, P. Häussler, H.-G. Boyen, A. Cossy-Favre, P. Oelhafen
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Volume:
91
Year:
1995
Language:
english
Pages:
5
DOI:
10.1016/0169-4332(95)00101-8
File:
PDF, 321 KB
english, 1995
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