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Stress in Al, AlSiCu, and AlVPd films on oxidized Si substrates
G.J. Leusink, J.P. Lokker, M.J.C. van den Homberg, J.F. Jongste, T.G.M. Oosterlaken, G.C.A.M. Janssen, S. RadelaarVolume:
91
Year:
1995
Language:
english
Pages:
5
DOI:
10.1016/0169-4332(95)00121-2
File:
PDF, 325 KB
english, 1995