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Very low temperature polycrystalline silicon films with very large grains deposited for thin film transistor applications
K.C. Wang, T.R. Yew, H.L. HwangVolume:
92
Year:
1996
Language:
english
Pages:
7
DOI:
10.1016/0169-4332(95)00210-3
File:
PDF, 311 KB
english, 1996