Ultra-thin gate dielectrics grown by low-temperature processes for applications to ULSI devices
Huey-Liang Hwang, Po-Ching Chen, Klaus Y.J. HsuVolume:
92
Year:
1996
Language:
english
Pages:
13
DOI:
10.1016/0169-4332(95)00227-8
File:
PDF, 882 KB
english, 1996