The properties of SiO2 films using direct photo-chemical vapor deposition on strained SiGe layers
C.T. Lin, S.J. Chang, D.K. Nayak, Y. ShirakiVolume:
92
Year:
1996
Language:
english
Pages:
5
DOI:
10.1016/0169-4332(95)00228-6
File:
PDF, 312 KB
english, 1996