Refractive index behavior of boron-doped silica films by plasma-enhanced chemical vapor deposition
R.H. Horng, F. Chen, D.S. Wuu, T.Y. LinVolume:
92
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0169-4332(95)00261-8
File:
PDF, 274 KB
english, 1996