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Reliability study of sub-micron titanium silicide contacts
C.C. Lin, W.S. Chen, H.L. Hwang, K.Y.J. Hsu, H.K. Liou, K.N. TuVolume:
92
Year:
1996
Language:
english
Pages:
5
DOI:
10.1016/0169-4332(95)00314-2
File:
PDF, 310 KB
english, 1996