AFM and STM studies on In2O3 and ITO thin films deposited...

AFM and STM studies on In2O3 and ITO thin films deposited by atomic layer epitaxy

Timo Asikainen, Mikko Ritala, Markku Leskelä, Thomas Prohaska, Gernot Friedbacher, Manfred Grasserbauer
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Volume:
99
Year:
1996
Language:
english
Pages:
8
DOI:
10.1016/0169-4332(96)00110-9
File:
PDF, 636 KB
english, 1996
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