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Selective epitaxial Si based layers and TiSi2 deposition by integrated chemical vapor deposition
J.L. Regolini, J. Margail, S. Bodnar, D. Maury, C. MorinVolume:
100-101
Year:
1996
Language:
english
Pages:
9
DOI:
10.1016/0169-4332(96)00340-6
File:
PDF, 837 KB
english, 1996