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The formation of Ti(OCN) layers produced from metal—organic compounds using plasma-assisted chemical vapour deposition
T. Wierzchoń, J.R. Sobiecki, D. KrupaVolume:
59
Year:
1993
Language:
english
Pages:
4
DOI:
10.1016/0257-8972(93)90086-4
File:
PDF, 399 KB
english, 1993