![](/img/cover-not-exists.png)
A new method for film deposition in the discharge of target metal vapour
L. Bárdoš, H. Baránková, S. BergVolume:
72
Year:
1995
Language:
english
Pages:
7
DOI:
10.1016/0257-8972(94)02351-4
File:
PDF, 928 KB
english, 1995