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Process control by optical emission spectroscopy during growth of a-C: H from a CH4 plasma by plasma-enhanced chemical vapour deposition
C. Barholm-Hansen, M.D. Bentzon, M.E. Vigild, E. Findeisen, R. Feidenhans'l, J. Bindslev HansenVolume:
68-69
Year:
1994
Language:
english
Pages:
6
DOI:
10.1016/0257-8972(94)90241-0
File:
PDF, 560 KB
english, 1994