Effect of the substrate temperature on the structure and properties of Al2O3 layers reactively deposited by pulsed magnetron sputtering
O. Zywitzki, G. Hoetzsch, F. Fietzke, K. GoedickeVolume:
82
Year:
1996
Language:
english
Pages:
7
DOI:
10.1016/0257-8972(95)00270-7
File:
PDF, 685 KB
english, 1996