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On the phase formation of titanium oxide thin films deposited by reactive DC magnetron sputtering: influence of oxygen partial pressure and nitrogen doping
Pandian, Ramanathaswamy, Natarajan, Gomathi, Rajagopalan, S., Kamruddin, M., Tyagi, A. K.Volume:
116
Language:
english
Journal:
Applied Physics A
DOI:
10.1007/s00339-014-8351-1
Date:
September, 2014
File:
PDF, 868 KB
english, 2014