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Study of electrical and micro-structural properties of high-κ gate dielectric stacks deposited using pulse laser deposition for MOS capacitor applications
Srivastava, A., Mangla, O., Nahar, R. K., Gupta, V., Sarkar, C. K.Volume:
25
Language:
english
Journal:
Journal of Materials Science: Materials in Electronics
DOI:
10.1007/s10854-014-2011-2
Date:
August, 2014
File:
PDF, 982 KB
english, 2014