Fabrication and characterization of...

Electronic Materials Letters 2014 / 05 Vol. 10; Iss. 3

Fabrication and characterization of metal/insulator/semiconductor structures based on TiO2and TiO2/SiO2thin films prepared by low-temperature arc vapor deposition

Shubham, Kumar, Chakrabarti, P.
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Volume:
10
Language:
english
Journal:
Electronic Materials Letters
DOI:
10.1007/s13391-013-3244-6
Date:
May, 2014
File:
PDF, 496 KB
english, 2014
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