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Effects of solvent on the formation of the MUA monolayer on Si and its diffusion barrier properties for Cu metallization
Rahman, Mohammad Arifur, Han, Jung Suk, Jeong, Kyunghoon, Nam, Ho-seok, Lee, JaegabVolume:
10
Language:
english
Journal:
Electronic Materials Letters
DOI:
10.1007/s13391-013-3339-0
Date:
May, 2014
File:
PDF, 1.01 MB
english, 2014