Effect of ion-beam treatment during reactive high-frequency magnetron sputtering on macrostresses in ITO films
Krylov, P. N., Zakirova, R. M., Fedotova, I. V.Volume:
48
Language:
english
Journal:
Semiconductors
DOI:
10.1134/S1063782614060177
Date:
June, 2014
File:
PDF, 189 KB
english, 2014