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Controlled aluminum-induced crystallization of an amorphous silicon thin film by using an oxide-layer diffusion barrier
Hwang, Ji-Hyun, Kwak, Hyunmin, Kwon, Myeung HoiVolume:
64
Language:
english
Journal:
Journal of the Korean Physical Society
DOI:
10.3938/jkps.64.679
Date:
March, 2014
File:
PDF, 2.74 MB
english, 2014