Characterization of plasma-enhanced atomic layer deposition...

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films 2014 / 03 Vol. 32; Iss. 2

Characterization of plasma-enhanced atomic layer deposition of Al2O3 using dimethylaluminum isopropoxide

Yang, Jialing, Eller, Brianna S., Kaur, Manpuneet, Nemanich, Robert J.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4866378
Date:
March, 2014
File:
PDF, 1.79 MB
english, 2014
Conversion to is in progress
Conversion to is failed