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Improvement of the Anneal-Induced Valence Band Offset Variation by the Hybrid Deposition of ${\rm HfO}_{2}$ on Si
Fan, Jibin, Liu, Hongxia, Ma, Fei, Hao, YueVolume:
60
Language:
english
Journal:
IEEE Transactions on Electron Devices
DOI:
10.1109/ted.2013.2252904
Date:
May, 2013
File:
PDF, 496 KB
english, 2013