Self-Aligned Selective Emitter Formation Using Commercial Screen-Printed Contacts as a Plasma Etch Mask
Khandelwal, Rahul, Windgassen, Horst, Pletzer, Tobias Markus, Kurz, HeinrichVolume:
11
Language:
english
Journal:
Plasma Processes and Polymers
DOI:
10.1002/ppap.201300156
Date:
June, 2014
File:
PDF, 594 KB
english, 2014