[IEEE 2011 12th International Conference on Ultimate Integration on Silicon (ULIS) - Cork, Ireland (2011.03.14-2011.03.16)] Ulis 2011 Ultimate Integration on Silicon - Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques
Redolfi, A., Sleeckx, E., Devriendt, K., Shamiryan, D., Vandeweyer, T., Horiguchi, N., Togo, M., Wouter, J. M. D., Jurczak, M., Hoffmann, T., Cockburn, A., Gravey, V., Diehl, D. L.Year:
2011
Language:
english
DOI:
10.1109/ulis.2011.5758015
File:
PDF, 207 KB
english, 2011