Development of a multi-electron-beam source for sub-10 nm...

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures 2005 Vol. 23; Iss. 6

Development of a multi-electron-beam source for sub-10 nm electron beam induced deposition

van Bruggen, M. J., van Someren, B., Kruit, P.
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Volume:
23
Year:
2005
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.2091087
File:
PDF, 637 KB
english, 2005
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