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A Powerful Soft X-ray Source for X-ray Lithography Based on Plasma Focusing
Bogolyubov, E P, Bochkov, V D, Veretennikov, V A, Vekhoreva, L T, Gribkov, V A, Dubrovskii, A V, Ivanov, Yu P, Isakov, A I, Krokhin, O N, Lee, P, Lee, S, Nikulin, V Ya, Serban, A, Silin, P V, Feng, X,Volume:
57
Language:
english
Journal:
Physica Scripta
DOI:
10.1088/0031-8949/57/4/003
Date:
April, 1998
File:
PDF, 173 KB
english, 1998