Impact of Technology Scaling in sub-100 nm...

IEEE Transactions on Nuclear Science 2014 / 6 Vol. 61; Iss. 3

Impact of Technology Scaling in sub-100 nm nMOSFETs on Total-Dose Radiation Response and Hot-Carrier Reliability

Arora, Rajan, Fleetwood, Zachary E., Zhang, En Xia, Lourenco, Nelson E., Cressler, John D., Fleetwood, Daniel M., Schrimpf, Ronald D., Sutton, Akil K., Freeman, Greg, Greene, Brian
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Volume:
61
Language:
english
Journal:
IEEE Transactions on Nuclear Science
DOI:
10.1109/tns.2014.2320494
Date:
June, 2014
File:
PDF, 1.42 MB
english, 2014
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