Reactive pulsed magnetron sputtering process for alumina films
Kelly, P. J., Henderson, P. S., Arnell, R. D., Roche, G. A., Carter, D.Volume:
18
Year:
2000
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1319679
File:
PDF, 502 KB
english, 2000