Influence of the Substrate Bias Voltage on the Structure of...

Advanced Materials Research 2012 / 4 Vol. 506

Influence of the Substrate Bias Voltage on the Structure of Rutile TiO2 Films Prepared by Dual Cathode DC Unbalanced Magnetron Sputtering

Kasemanankul, P., Witit-Anun, N., Chaiyakun, S., Limsuwan, P.
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Volume:
506
Language:
english
Journal:
Advanced Materials Research
DOI:
10.4028/www.scientific.net/amr.506.82
Date:
April, 2012
File:
PDF, 854 KB
english, 2012
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