A voltage uniformity study in large-area reactors for RF...

Plasma Sources Science and Technology 1997 / 05 Vol. 6; Iss. 2

A voltage uniformity study in large-area reactors for RF plasma deposition

Sansonnens, L, Pletzer, A, Magni, D, Howling, A A, Hollenstein, Ch, Schmitt, J P M
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Volume:
6
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/6/2/010
Date:
May, 1997
File:
PDF, 665 KB
english, 1997
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