Photothermal reflectance investigation of processed silicon. I. Room-temperature study of the induced damage and of the annealing kinetics of defects in ion-implanted wafers
Christofides, Constantinos, Vitkin, I. Alex, Mandelis, AndreasVolume:
67
Year:
1990
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.345449
File:
PDF, 992 KB
english, 1990