Atomic layer deposition and characterization of hafnium...

Atomic layer deposition and characterization of hafnium oxide grown on silicon from tetrakis(diethylamino)hafnium and water vapor

Deshpande, Anand, Inman, Ronald, Jursich, Gregory, Takoudis, Christos
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Volume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1781183
File:
PDF, 548 KB
english, 2004
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