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Atomic layer deposition and characterization of hafnium oxide grown on silicon from tetrakis(diethylamino)hafnium and water vapor
Deshpande, Anand, Inman, Ronald, Jursich, Gregory, Takoudis, ChristosVolume:
22
Year:
2004
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.1781183
File:
PDF, 548 KB
english, 2004