Resistivity Lowering of Palladium Silicide Film due to...

Japanese Journal of Applied Physics 1985 / 11 Vol. 24; Iss. Part 2, No

Resistivity Lowering of Palladium Silicide Film due to Post-Annealing

Kikuchi, Akira, Hinode, Kenji
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Volume:
24
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.24.L867
Date:
November, 1985
File:
PDF, 408 KB
1985
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