Physical and electrical characterization of...

Journal of Physics D Applied Physics 2008 / 02 Vol. 41; Iss. 3

Physical and electrical characterization of atomic-layer-deposited Ru nanocrystals embedded into Al 2 O 3 for memory applications

Zhang, Min, Chen, Wei, Ding, Shi-Jin, Liu, Zhi-Ying, Huang, Yue, Liao, Zhong-Wei, Zhang, David Wei
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Volume:
41
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/41/3/032007
Date:
February, 2008
File:
PDF, 666 KB
english, 2008
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