[IEEE 2013 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu (2013.4.22-2013.4.24)] 2013 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Random interface trap induced fluctuation in 22nm high-k/metal gate junctionless and inversion-mode FinFETs

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