Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
2014 / 03 Vol. 32; Iss. 2
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Inductively coupled plasma reactive ion etching of GaAs wafer pieces with enhanced device yield
Connors, Michael K., Missaggia, Leo J., Spencer, William S., Turner, George W.Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4867356
Date:
March, 2014
File:
PDF, 1.77 MB
english, 2014