Inductively coupled plasma reactive ion etching of GaAs...

Inductively coupled plasma reactive ion etching of GaAs wafer pieces with enhanced device yield

Connors, Michael K., Missaggia, Leo J., Spencer, William S., Turner, George W.
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Volume:
32
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.4867356
Date:
March, 2014
File:
PDF, 1.77 MB
english, 2014
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