Fullerene-assisted electron-beam lithography for pattern...

Optics Letters 2014 / 03 Vol. 39; Iss. 6

Fullerene-assisted electron-beam lithography for pattern improvement and loss reduction in InP membrane waveguide devices

Jiao, Yuqing, Pello, Josselin, Mejia, Alonso Millan, Shen, Longfei, Smalbrugge, Barry, Geluk, Erik Jan, Smit, Meint, van der Tol, Jos
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Volume:
39
Language:
english
Journal:
Optics Letters
DOI:
10.1364/OL.39.001645
Date:
March, 2014
File:
PDF, 405 KB
english, 2014
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