Attachment-induced ionization instability in...

Plasma Sources Science and Technology 2003 / 05 Vol. 12; Iss. 2

Attachment-induced ionization instability in electronegative capacitive RF discharges

Descoeudres, A, Sansonnens, L, Hollenstein, Ch
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Volume:
12
Language:
english
Journal:
Plasma Sources Science and Technology
DOI:
10.1088/0963-0252/12/2/305
Date:
May, 2003
File:
PDF, 437 KB
english, 2003
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