Structural defects and electronic properties of the Cu-doped topological insulator Bi
Wang, Yi-Lin, Xu, Yong, Jiang, Ye-Ping, Liu, Jun-Wei, Chang, Cui-Zu, Chen, Mu, Li, Zhi, Song, Can-Li, Wang, Li-Li, He, Ke, Chen, Xi, Duan, Wen-Hui, Xue, Qi-Kun, Ma, Xu-CunVolume:
84
Language:
english
Journal:
Physical Review B
DOI:
10.1103/PhysRevB.84.075335
Date:
August, 2011
File:
PDF, 436 KB
english, 2011