Atomically Controlled Processing for Group IV...

Japanese Journal of Applied Physics 2006 / 9 Vol. 45; Iss. 9A

Atomically Controlled Processing for Group IV Semiconductors by Chemical Vapor Deposition

Murota, Junichi, Sakuraba, Masao, Tillack, Bernd
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Volume:
45
Language:
english
Journal:
Japanese Journal of Applied Physics
DOI:
10.1143/JJAP.45.6767
Date:
September, 2006
File:
PDF, 906 KB
english, 2006
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